Structural Stability of Diffusion Barriers in Cu/Ru/MgO/Ta/Si
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چکیده
منابع مشابه
Structural Stability of Diffusion Barriers in Cu/Ru/MgO/Ta/Si
Various structures of Cu (50 nm)/Ru (2 nm)/MgO (0.5-3 nm)/Ta (2 nm)/Si were prepared by sputtering and electroplating techniques, in which the ultra-thin trilayer of Ru (2 nm)/MgO (0.5-3 nm)/Ta (2 nm) is used as the diffusion barrier against the interdiffusion between Cu film and Si substrate. The various structures of Cu/Ru/MgO/Ta/Si were characterized by four-point probes for their sheet resi...
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ژورنال
عنوان ژورنال: Nanomaterials
سال: 2015
ISSN: 2079-4991
DOI: 10.3390/nano5041840